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adlib96000001 |
| 003 |
ViArRB |
| 005 |
20151026131834.0 |
| 008 |
960221s1955 dcuabcdjdbkoqu001 0deng d |
| 020 |
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|a 0-521-59175-9
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| 022 |
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| 040 |
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|a Adlib
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| 082 |
|
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|a 621.382:533.9
|
| 245 |
|
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|a Plasma processes for semiconductor fabrication
|
| 250 |
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| 260 |
|
|
|a Cambridge
|b Cambridge University Press
|c 1999
|
| 300 |
|
|
|a ix,221p.
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| 500 |
|
|
|a
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| 100 |
|
|
|a Hitchon, W. Nicholas G.
|
| 700 |
|
|
|
| 942 |
|
|
|c BK
|6 _
|
| 653 |
|
|
|a Semiconductors - Etching
|a Plasma etching
|a Semiconductor fabrication - Plasma physics
|a Plasma reactors
|
| 999 |
|
|
|c 36224
|d 36224
|
| 952 |
|
|
|0 0
|1 0
|4 0
|6 6213825339_HIT
|7 0
|9 47952
|a UL
|b UL
|d 2010-06-16
|o 621.382:533.9 HIT
|p 00047762
|r 2010-06-16
|w 2010-06-16
|y BK
|