Plasma processes for semiconductor fabrication

Bibliographic Details
Main Author: Hitchon, W. Nicholas G.
Format: Printed Book
Language:English
Published: Cambridge Cambridge University Press 1999
Subjects:
Semiconductors - Etching > Plasma etching > Semiconductor fabrication - Plasma physics > Plasma reactors

UL

Holdings details from UL
Call Number: 621.382:533.9 HIT
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