Hitchon, W. N. G. (1999). Plasma processes for semiconductor fabrication. Cambridge University Press.
Chicago Edition CitationHitchon, W. Nicholas G. Plasma Processes for Semiconductor Fabrication. Cambridge: Cambridge University Press, 1999.
Cita MLAHitchon, W. Nicholas G. Plasma Processes for Semiconductor Fabrication. Cambridge University Press, 1999.
Atenció: Aquestes cites poden no estar 100% correctes.