Hydrogenated amorphous silicon alloy deposition processes /

Detalles Bibliográficos
Autor Principal: Luft, Werner
Outros autores: Tsuo, Y. Simon
Formato: Printed Book
Idioma:English
Publicado: New York : M. Dekker, c1993.
Series:Applied physics series (Marcel Dekker, Inc.) ; 1.
Subjects:
Thin film devices--Design and construction > Silicon alloys > Plasma-enhanced chemical vapor deposition > Thin films--Optical properties > Thin films--Electric properties.
Descripción
Descrición Física:xiv, 327 p. : ill. ; 24 cm.
ISBN:0824791460

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