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Physical vapor deposition of thin films
| Autor principal: | |
|---|---|
| Format: | Printed Book |
| Publicat: |
John Wiley & Sons Inc., New York
2000
|
| Matèries: |
| LEADER | 00530nam a2200193 4500 | ||
|---|---|---|---|
| 020 | |a 9780471330011 | ||
| 082 | |a 671.735 MAH-P | ||
| 100 | |a Mahan, John E | ||
| 245 | |a Physical vapor deposition of thin films | ||
| 250 | |||
| 260 | |a John Wiley & Sons Inc., New York |c 2000 | ||
| 300 | |a 312 | ||
| 490 | |||
| 500 | |||
| 590 | |a rvr | ||
| 650 | |a Physical vapor deposition | ||
| 942 | |c BK | ||
| 999 | |c 83864 |d 83864 | ||
| 952 | |0 0 |1 0 |4 0 |6 671_735000000000000_MAHP |7 0 |9 97332 |a PHY |b PHY |l 0 |o 671.735 MAH-P |p PHY05522 |r 2019-09-24 |w 2019-09-24 |y BK | ||