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00897 a2200193 4500 |
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121211b xxu||||| |||| 00| 0 eng d |
| 020 |
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|a 9780471495246
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| 082 |
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|a 660.284298
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| 245 |
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|a Crystal growth technology /
|c [edited by]YHans J Scheel , Tsuguo Fukuda
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| 260 |
|
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|a West Sussex:
|b Wiley,
|c 2004
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| 300 |
|
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|a xxvi,668p,
|b ill..
|c 23cm.
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| 500 |
|
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|a Includes bibliographical references and index.
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| 505 |
|
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|a Part 1: General aspects of crystal growth technology-- Part 2 Silicon-- Part 3: Compound semiconductors-- Part 4: Oxides and halides--Part 5: Crystal machining -- Part 6:Epitaxy and layer deposition - Index
|
| 650 |
|
0 |
|a Crystallization .
|
| 700 |
|
|
|a Scheel, Hans J
|e Editor.
|
| 700 |
|
|
|a Fukuda,Tsuguo
|e Editor.
|
| 942 |
|
|
|c BK
|
| 999 |
|
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|c 96189
|d 96189
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| 952 |
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|0 0
|1 0
|4 0
|6 660_284298000000000_CRY
|7 0
|9 96007
|a UL
|b UL
|c ST1
|d 2011-11-24
|g 0.00
|l 0
|o 660.284298 CRY
|p 86343
|r 2012-10-28
|v 9538.00
|y BK
|