Á lódáil...
Ion implantation in semiconductors: Silicon and germanium /
| Príomhúdar: | |
|---|---|
| Formáid: | Printed Book |
| Teanga: | English |
| Foilsithe: |
New York :
Academic Press,
1970.
|
| LEADER | 00495nam a2200133Ia 4500 | ||
|---|---|---|---|
| 008 | 150624b xxu||||| |||| 00| 0 eng d | ||
| 082 | |a 546.683577 | ||
| 100 | |a Mayer, James W. | ||
| 245 | |a Ion implantation in semiconductors: |b Silicon and germanium / |c James W. Mayer | ||
| 260 | |a New York : |b Academic Press, |c 1970. | ||
| 300 | |a 280 p. | ||
| 942 | |c BK | ||
| 999 | |c 11192 |d 11192 | ||
| 952 | |0 0 |1 0 |4 0 |6 546_683577000000000_MAY_I |7 0 |9 11191 |a UL |b UL |c ST2 |d 1998-09-07 |l 0 |o 546.683577 MAY/I |p 17201 |r 2012-10-27 |w 2012-10-27 |y BK | ||