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00778nam a22001817a 4500 |
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20151026130326.0 |
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091019t xxu||||| |||| 00| 0 eng d |
| 020 |
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|a 0-8194-5166-5
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| 080 |
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|a 621.3.049.77
|b SCH
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| 100 |
|
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|a Schellenberg, F.M. [ed.]
|e ed. by
|9 7461
|
| 245 |
|
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|a Selected papers on resolution enhancement techniques in optical lithography-Bellingham
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| 260 |
|
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|a Washington
|b SPIE Press
|c 2004
|9 7462
|
| 300 |
|
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|a xx, 875p.
|
| 490 |
|
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|a (SPIE milestone series v.178)
|
| 653 |
|
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|a Integrated circuits-design and construction
|a Microlithography
|a Photolithography
|a semiconductors-Etching
|a Optical lithography
|
| 942 |
|
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|c BK
|6 _
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| 999 |
|
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|c 3254
|d 3254
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| 952 |
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|0 0
|1 0
|2 udc
|4 0
|6 621304977_SCH
|7 0
|9 13602
|a UL
|b UL
|d 2009-10-19
|o 621.3.049.77 SCH
|p 00053942
|r 2009-10-19
|w 2009-10-19
|y BK
|