Rajeev Kumar, K., & Sathianandan, K. (1989). Eelctrical conduction and dielectric behaviour of thin films of vaccum evaporated amorphous silicon, hydrogenated amorphous silicon and chemically deposited cadmium sulphide. Cochin University of Science and technology.
Chicago Edition CitationRajeev Kumar, K., and K. Sathianandan. Eelctrical Conduction and Dielectric Behaviour of Thin Films of Vaccum Evaporated Amorphous Silicon, Hydrogenated Amorphous Silicon and Chemically Deposited Cadmium Sulphide. Cochin: Cochin University of Science and technology, 1989.
MLA引文Rajeev Kumar, K., and K. Sathianandan. Eelctrical Conduction and Dielectric Behaviour of Thin Films of Vaccum Evaporated Amorphous Silicon, Hydrogenated Amorphous Silicon and Chemically Deposited Cadmium Sulphide. Cochin University of Science and technology, 1989.