APA-referens

Rajeev Kumar, K., & Sathianandan, K. (1989). Eelctrical conduction and dielectric behaviour of thin films of vaccum evaporated amorphous silicon, hydrogenated amorphous silicon and chemically deposited cadmium sulphide. Cochin University of Science and technology.

Chicago-stil citat

Rajeev Kumar, K., och K. Sathianandan. Eelctrical Conduction and Dielectric Behaviour of Thin Films of Vaccum Evaporated Amorphous Silicon, Hydrogenated Amorphous Silicon and Chemically Deposited Cadmium Sulphide. Cochin: Cochin University of Science and technology, 1989.

MLA-referens

Rajeev Kumar, K., och K. Sathianandan. Eelctrical Conduction and Dielectric Behaviour of Thin Films of Vaccum Evaporated Amorphous Silicon, Hydrogenated Amorphous Silicon and Chemically Deposited Cadmium Sulphide. Cochin University of Science and technology, 1989.