Rajeev Kumar, K., & Sathianandan, K. (1989). Eelctrical conduction and dielectric behaviour of thin films of vaccum evaporated amorphous silicon, hydrogenated amorphous silicon and chemically deposited cadmium sulphide. Cochin University of Science and technology.
Stile di citazione ChicagoRajeev Kumar, K., e K. Sathianandan. Eelctrical Conduction and Dielectric Behaviour of Thin Films of Vaccum Evaporated Amorphous Silicon, Hydrogenated Amorphous Silicon and Chemically Deposited Cadmium Sulphide. Cochin: Cochin University of Science and technology, 1989.
Citazione MLARajeev Kumar, K., e K. Sathianandan. Eelctrical Conduction and Dielectric Behaviour of Thin Films of Vaccum Evaporated Amorphous Silicon, Hydrogenated Amorphous Silicon and Chemically Deposited Cadmium Sulphide. Cochin University of Science and technology, 1989.