Hydrogenated amorphous silicon alloy deposition processes /

Bibliographic Details
Main Author: Luft, Werner
Other Authors: Tsuo, Y. Simon
Format: Printed Book
Language:English
Published: New York : M. Dekker, c1993.
Series:Applied physics series (Marcel Dekker, Inc.) ; 1.
Subjects:
Thin film devices--Design and construction > Silicon alloys > Plasma-enhanced chemical vapor deposition > Thin films--Optical properties > Thin films--Electric properties.

PHY

Holdings details from PHY
Call Number: 621.3815/2 LUF
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