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00918pam a2200205 a 4500 |
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20200810155259.0 |
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930310s1993 nyua b 001 0 eng |
| 082 |
0 |
0 |
|a 621.3815/2
|b LUF
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| 100 |
1 |
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|a Luft, Werner.
|9 5912
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| 245 |
1 |
0 |
|a Hydrogenated amorphous silicon alloy deposition processes /
|c Werner Luft, Y. Simon Tsuo.
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| 300 |
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|a xiv, 327 p. :
|b ill. ;
|c 24 cm.
|
| 490 |
1 |
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|a Applied physics ;
|v 1
|
| 653 |
|
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|a Thin film devices--Design and construction
|a Silicon alloys
|a Plasma-enhanced chemical vapor deposition
|a Thin films--Optical properties
|a Thin films--Electric properties.
|
| 700 |
1 |
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|a Tsuo, Y. Simon.
|9 8736
|
| 942 |
|
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|c BK
|6 _
|
| 260 |
|
|
|a New York :
|b M. Dekker,
|c c1993.
|
| 020 |
|
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|a 0824791460
|
| 830 |
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0 |
|a Applied physics series (Marcel Dekker, Inc.) ;
|v 1.
|9 8737
|
| 999 |
|
|
|c 215070
|d 215070
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| 952 |
|
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|0 0
|1 0
|2 ddc
|4 0
|6 62138152_LUF
|7 0
|9 278790
|a PHY
|b PHY
|d 2011-03-07
|o 621.3815/2 LUF
|p PHY013604
|r 2011-03-07
|w 2011-03-07
|y BK
|