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Electrical conduction and dielectrical behavior of thin films of vaccum evaporated amorphus silicon, Hydrogenate amorphus silicon and chemically deposite cadmium sheets
| Autor principal: | |
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| Formato: | Ph.D Thesis |
| Lenguaje: | English |
| Publicado: |
Kochi
Dept. of Physics - CUSAT
1989
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| Materias: |
UL
| Número de Clasificación: |
539.216:537.311:546.28 RAJ |
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| Copia | Estatus de actividad no disponible |