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Electrical conduction and dielectrical behavior of thin films of vaccum evaporated amorphus silicon, Hydrogenate amorphus silicon and chemically deposite cadmium sheets
1. Verfasser: | |
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Format: | Ph.D Thesis |
Sprache: | English |
Veröffentlicht: |
Kochi
Dept. of Physics - CUSAT
1989
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Schlagworte: |
UL
Signatur: |
539.216:537.311:546.28 RAJ |
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Exemplar | Live-Status nicht verfügbar |