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Electrical conduction and dielectrical behavior of thin films of vaccum evaporated amorphus silicon, Hydrogenate amorphus silicon and chemically deposite cadmium sheets
Hovedforfatter: | |
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Format: | Ph.D Thesis |
Sprog: | English |
Udgivet: |
Kochi
Dept. of Physics - CUSAT
1989
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Fag: |
UL
Klassifikationsnummer: |
539.216:537.311:546.28 RAJ |
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Kopi | Live Status Unavailable |